Get current pricing for Ccr Technology, COPRA DN 160 Inductively Coupled Plasma Source For Pecvd, Surface Cleaning, Oxidation, Nitridation And Activation Processes. 8 In. Cf Single Turn Icp Rf Plasma Sou . Product Category: Semiconductor, Sub Category::

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Manufacturer: Ccr Technology Part number: COPRA DN 160 Description: Inductively Coupled Plasma Source For Pecvd, Surface Cleaning, Oxidation, Nitridation And Activation Processes. 8 In. Cf Single Turn Icp Rf Plasma Sou . Product Category: Semiconductor, Sub Category:

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Manufacturer: Ccr Technology Part number: COPRA DN 160 Description: Inductively Coupled Plasma Source For Pecvd, Surface Cleaning, Oxidation, Nitridation And Activation Processes. 8 In. Cf Single Turn Icp Rf Plasma Sou . Product Category: Semiconductor, Sub Category: