Get current pricing for Trion Technology, PHANTOM II Icp Inductively Coupled Plasma Etch System. For Applications Requiring A Downstream, High Density Plasma Source. Allows For Higher Plasma Densities At . Product Category: Semiconductor, Sub Category::

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Manufacturer: Trion Technology Part number: PHANTOM II Description: Icp Inductively Coupled Plasma Etch System. For Applications Requiring A Downstream, High Density Plasma Source. Allows For Higher Plasma Densities At . Product Category: Semiconductor, Sub Category:

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Manufacturer: Trion Technology Part number: PHANTOM II Description: Icp Inductively Coupled Plasma Etch System. For Applications Requiring A Downstream, High Density Plasma Source. Allows For Higher Plasma Densities At . Product Category: Semiconductor, Sub Category: